TOKYO--(BUSINESS WIRE)--Nikon Corporation has announced release of the NSR-S622D ArF immersion scanner to deliver world-class overlay and ultra-high productivity for the most demanding multiple ...

Dinesh Bettadapur, Irresistible Materials’ CEO, discusses the company’s strategic partnership with TOK, the evolution of ...

2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...

Si2 announced that Cadence has donated extensions to the OpenAccess community which enable physical design tools to represent Multi-Patterned Technology (MPT). Conventional photolithography cannot ...

When we talk about computing these days, we tend to talk about software and the engineers who write it. But we wouldn’t be anywhere without the hardware and the physical sciences that have enabled it ...

As anticipated, this year’s Advanced Lithography + Patterning Symposium was a very informative event, with many interesting papers being presented across a wide range of subjects. Many papers ...

After a period of delays, EUV pellicles are emerging and becoming a requirement in high-volume production of critical chips. At the same time, the pellicle landscape for extreme ultraviolet (EUV) ...

A-Gas Electronic Materials has expanded its portfolio with the mr-P 22G grayscale photoresist from Micro Resist Technology.

Colloidal lithography is a nanofabrication technique that utilizes colloidal particles as masks for creating ordered nanostructures on substrates. This cost-effective and scalable method has gained ...

If EUV is out of reach and access to DUV is tightening, there is a limit to how far chipmakers can go with older gear and new ...