Aprisa and Apogee support double patterning-compliant design rules while maintaining desirable routability for complex designs at 20nm SANTA CLARA, Calif.--(BUSINESS WIRE)-- ATopTech, the leader in ...
(PhysOrg.com) -- Toshiba Corporation today announced that it has developed a breakthrough technology for steep channel impurity distribution that delivers a solution to a key problem for 20nm ...
HSINCHU, Taiwan--(BUSINESS WIRE)--SpringSoft, Inc., a global supplier of specialized IC design software, today announced that the Laker 3™ Custom IC Design Platform has been included in TSMC's ...
In a keynote speech at TSMC’s San Jose Technical Symposium this morning, the giant foundry’s senior vice president of R/D Shang-Yi Chiang outlined the company’s process plans beyond 28nm. He said TSMC ...
Hsinchu, Taiwan, June 29, 2012 - United Microelectronics Corporation (NYSE: UMC; TWSE: 2303) ("UMC"), a leading global semiconductor foundry, today announced that it has licensed IBM technology to ...
The 28nm semiconductor manufacturing node is in full swing with 20nm process development ramping quickly. As such, the industry has been looking ahead to the next node shrink to achieve the power, ...
One of Taiwan’s major fabs has decided to skip the 22nm process node in favour of going straight to the 20nm node. The Taiwan Semiconductor Manufacturing Company (TSMC) says its move to 20nm will ...
SANTA CLARA, Calif.--(BUSINESS WIRE)--ATopTech, the leader in next generation physical design solutions, today announced that Aprisa™ and Apogee TM, the company’s place and route solution, are ...
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